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 |  |  |  |  Chemical Mechanical Polishing in Silicon Processing, Volume 63
In the engineering world, many ideas and plans are conceived in the
information exchanges that occur over lunch. In the summer of 1997, one of
the editors (Shin Hwa Li) was assigned to assist our CMP module at the
Crolles facility of STMicroelectronics near Grenoble, France. One day, in
the company cafeteria, while sitting near... |
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